Process / Senior Process Engineer - SiC Epitaxy, (APM), IME

This position is within the National Semiconductor Translation and Innovation Centre (NSTIC) – Power Electronics.

Responsibilities:

• Design and implement innovative SiC epitaxial processes on an industrial hot-wall CVD system, focusing on achieving exceptional dopant and thickness uniformity, as well as minimal extended defect density on 6- and 8-inch SiC substrates.
• Perform metrology and characterization of SiC epilayers (e.g., dopant and thickness uniformity, surface roughness, crystal quality, stress, carrier lifetime, etc.).
• Conduct optical and photoluminescence inspections of extended defects in SiC epilayers, including critical defects such as micropipes, carrots, triangles, downfalls, stacking faults, and basal plane dislocations.
• Design experiments to minimize point and extended defect densities in SiC, with emphasis on enhancing SiC power device performance.
• Develop advanced epitaxy processes for cutting-edge devices, such as SiC selective epitaxy and SiC trench-filling epitaxy.
• Prepare technical presentations and papers for internal meetings, conferences, and journals and draft technical disclosures/IP.
• Collaborate with IME's NSTIC – Power team to address key technical challenges in the SiC power electronics industry.
• Contribute ideation for new funding proposals.
• Perform all other reasonable duties as assigned.

Requirements:

• Bachelor's or Master's degree in Electrical/Electronic Engineering, Materials Science, Physics, Chemistry or a related field.
• 2 to 3 years of experience in semiconductor CVD process, preferrably epitaxy process development or manufacturing (Si, SiC GaN, or other semiconductor materials).
• Strong knowledge of semiconductor processes (e.g., lithography, etching) and characterization techniques (e.g., SEM, TEM, XRD).
• Excellent communication, collaboration, and self-motivation skills.
• Avid technical reader, critical thinker, and strong team player.
• Proficiency in data analysis and DOE tools (e.g., Excel, JMP, Origin) is an advantage.